U-FAST Desktop for R&D Applications
Model | Max. Sintered Diameter [mm] | Pressing force [kN] | Current [A] | Voltage [V] | Ultimate vacuum [mbar] |
U-FAST Desktop | 25 | 40 | 1 000 | 14 | < 9×10-3 |
The GeniCore U-FAST Desktop model is a great choice for R&D applications where the aim is to develop new materials which can be then scaled up to bigger diameters by using GeniCore U-FAST(SPS) Device.
Manufacturing process




Mold inside U-FAST chamber

Temperature measurement

Conventional Method
Indirect heating (radiation / convection)

- Heating by radiation
- Low heating factor
- Temperature gradient in sintered materials
- Time-consuming and energy-consuming processes
U-FAST technology
Direct heating (conduction)

- Heating using Joule heating
- Fast, economical processes (30 min)
- Low energy consumption
- Lower sintering temperature
- Limited grain growth
Pulse duration below 1 ms

Pulse duration, which lasts even less than 1ms, gives the advantage of our U-FAST technology over SPS devices from competitors. Current pulses are shown using an oscilloscope