U-FAST Glovebox (GC)

Bulk Metallic Glasses, High-Entropy Alloys, thermoelectrics, transparent ceramics, and nano-powders, which require oxygen-free and moisture-free environments.

Yes. Thanks to modular architecture, you can expand the system without a full replacement.

Process quality is guaranteed through the integration of a Siemens PLC for live data logging and precise control, combined with MBRAUN’s best-in-class gas management for ultimate repeatability and traceability.

Any material that degrades, oxidizes, or reacts with ambient air at high temperatures. Our U-FAST GC system is specifically designed for processing highly reactive powders and oxygen-sensitive materials, ensuring their chemical purity and final properties. This includes:

• Bulk Metallic Glasses (BMGs) and High-Entropy Alloys (HEAs), which require controlled cooling in an inert environment to maintain their amorphous or unique crystal structures.
• Non-oxide transparent ceramics (like AlON or MgAl₂O₄), where even trace amounts of oxygen can ruin optical transparency.

Nanostructured materials and nano-powders, whose high surface area makes them extremely prone to oxidation, which would inhibit full densification.

Yes, absolutely. The system is built on a modular architecture, allowing you to upgrade from a compact GC55 configuration to a high-capacity GC85-HVwithout replacing the entire platform. This modularity protects your initial investment and allows the system to grow with your research or production needs.

Quality is guaranteed by a dual-control approach:

• Sintering Process Control: A Siemens PLC provides precise, real-time control and logging of all critical parameters (force, temperature, displacement, current), ensuring every cycle is identical.
• Atmosphere Purity Control: The integrated MBRAUN system continuously monitors and purifies the inert gas, maintaining ultra-low levels of oxygen and moisture (<1 ppm), which eliminates atmospheric variables from your process.

While both use an electric field and pressure, our proprietary U-FAST technology utilizes custom-shaped current pulses with ultra-short durations (<1 ms). This allows for extremely rapid heating while minimizing heat diffusion. The primary benefit is the ability to achieve full densification of materials before significant grain growth can occur, which is critical for preserving nanostructures and achieving superior mechanical or optical properties.

The primary advantage is the elimination of contamination risk. With a fully integrated system, sensitive powders are never exposed to ambient air—from powder handling and die loading to sintering and cooldown. This streamlined workflow not only guarantees material purity but also improves safety, saves valuable lab space with its compact footprint, and increases overall process efficiency.